Instrument Facilities
The Integrated Nanostructured Systems Instrumentation Facility (INSIF) consists of a set of centrally-coordinated instruments that support research in the UB2020 Strategic Strength in Integrated Nanostructured Systems, as well as related physics, engineering, and materials research. All facilities are available to both UB faculty and external users, for modest cost-recovery fees. Additional support for the facility comes from the UB Office of the Vice President for Research, the UB School of Engineering, and the UB College of Arts and Sciences. Individual instruments and instrument clusters are described below. For further information, contact Dr. Mark Swihart at insdirector@eng.buffalo.edu.
High Resolution Transmission Electron Microscopy Facility (HRTEM)
The High Resolution Transmission Electron Microscopy facility (HRTEM) of INSIF is a central, shared facility for microanalysis. The facility provides microanalysis services to both researchers on the UB campus, as well as off-campus industries and other institutions in the region. The HRTEM staff will provide assistance and training in electron microscopy techniques to enable research groups to pursue their research objectives.
The JEOL JEM 2010 is a high-resolution electron microscope with an accelerating voltage of 200KV, and a point resolution of 0.19 nm. It is equipped with a 5-axis micro-active goniometer, which makes micro-structural analysis possible for many kinds of crystalline materials. The TEM provides several different types of analyses: 1) morphology images, in either bright or dark field; 2) the corresponding crystal structures by electron diffraction; 3) the elemental composition (from carbon to heavier elements) through use of the Energy Dispersive x-ray (EDX) analysis system (spec. instrumentation detailed below). Additionally there are two different modes of operation: the Convergent Beam Diffraction (CBD) mode is very helpful in analyzing crystal symmetry, while the Nano Beam Diffraction (NBD) mode will provide the crystal structure for nano-particles.
Specific Instrumentation*:
- PRISM Digital Spectrometer, manufactured by PGT-Princeton Gamma-Tech
- 306-1 Ion Mill machine by VCR Group, Inc.
- D500 Dimpler by VCR Group, Inc.
- WS-22 Wire Saw by Princeton Scientific Corp.
- Grinding/polishing machines by Struers
*Additionally, a new Gatan CCD camera and associated Digital Micrograph software was installed in Summer 2008, providing improved lattice-resolution HRTEM capabilities.
Contact:
Dr. Yueling Qin
109 Fronczak Hall
UB North Campus
Phone: (716) 645-2017, ext. 116
E-mail: yqin@buffalo.edu
The Clean Room Facility
The Clean Room Facility of INSIF provides optical lithography and device processing, fabrication, and testing. It provides a range of fabrication and processing capabilities to UB researchers, as well as external users, in conjunction with our faculty.
Capabilities:
The CRF consists of a 300 sq. ft., class 100 space with controlled humidity and temperature, coupled with an adjacent, class 1000 room without humidity and temperature control. The class 100 room contains the following: a chemical process station, several ovens, thermal and e-beam evaporators, a mask-aligner, a reactive ion etcher, and a photoresist spinner. Additionally, the recently completed class 1000 room presently contains: a Plasma-assisted Chemical Vapor Deposition System, a three-zone furnace, and a four-point probe resistance tester.
A sub-micron probe station and our cryogenic systems allow testing of current-voltage temperature, capacitance-voltage-temperature, deep-level transient spectroscopy, and quasistatic C-V.
These facilities permit deposition of thin films of most dielectric and metallic materials through one of the following processes:
- one of the evaporation techniques
- fabrication of electron devices with feature sizes greater than 2 microns
- electrical analysis of materials and devices
Facilities in addition to the clean space:
- Samco IC Reactive Ion Etcher
- Integrated Technologies P-8000 Photoresist Spinner
- Chemical Bench
- Denton DEG-2 e-beam Evaporator
- Denton DV502 Thermal Evaporator
- Oriel Mask Aligner
- Gaertner Ellipsometer
- Alessi 4-point Probe
- Trion-Orion Plasma Enhanced CVD System
Contact:
Dr. W.A. Anderson
Phone: (716) 645-2422, ext. 1215
Fax: (716) 645-5964
E-mail: wanders@acsu.buffalo.edu
Cryogenics Facility
The Cryogenics Facility of INSIF provides a centralized distribution center for liquid nitrogen and liquid helium on the North Campus. It is integral in supporting UB’s research efforts in low-temperature physics, particularly in the area of spintronics and semiconductor nanostructures.
The facility is equipped with a Process Systems Model 1410 Helium Liquefier, capable of liquefaction rates of 40 liters/hour. The liquefier is located on the ground floor of Fronczak Hall, which has building-wide helium gas recovery. Liquid nitrogen is distributed centrally from a 12,000 liter storage container and from several additional portable containers.
Contact:
Mr. Jim Wolf
Phone: (716) 645-2590
Electron Beam Lithography Facility
The Electron Beam Lithography Facility at the University at Buffalo is located in 118 Bonner Hall on the North Campus. Major equipment in the EBL facility includes:
- JEOL JSM6500F Scanning Electron Microscope
- Nabity NPGS E-Beam Writing System
- CEE Model 100 Spin Coater
- Bake Oven
Contact:
Dr. Yueling Qin
109 Fronczak Hall
UB North Campus
Phone: (716) 645-2017, ext. 116
E-mail: yqin@buffalo.edu
Device Bonding
A K&S Model 4522 Digital Ball Wire Bonder supports the various fabrication and characterization labs of INSIF. This is a ball-bonder type machine that can store various wire bonding “recipes.” It can bond with gold wires from 18-75 microns in diameter. The machine is located in 210 Bonner Hall on UB’s North Campus.
Contact:
Dr. Albert H. Titus
213 Bonner Hall
UB North Campus
Phone: (716) 645-3115, ext. 1200
E-mail: ahtitus@eng.buffalo.edu
